Abstract

A high-purity synthetic fused silica sample (Suprasil 2) was irradiated by a KrF laser at 248 nm, 300 Hz, and 500 mJ/cm². Transmission at 248 nm, transmission at 210 nm, and fluorescence at 650 nm were monitored in real time. The sample starts out in a weakly absorbing state. Then, after several million pulses, it experiences a sudden increase in 248-nm absorption with accompanying dramatic changes in its relaxation and fluorescence behavior. Further irradiation leads to (partial) bleaching of the UV absorption.

© 1993 Optical Society of America

Transient 210-nm absorption in fused silica induced by high-power UV laser irradiation

Norbert Leclerc, Christoph Pfleiderer, Hermine Hitzler, Jürgen Wolfrum, Karl-Otto Greulich, Stephan Thomas, Heinz Fabian, Ralf Takke, and Wolfgang Englisch
Opt. Lett. 16(12) 940-942 (1991)

Photoinduced optical absorption and 400-nm luminescence in low-germanium-content optical fiber preforms irradiated with ArF and KrF excimer-laser light

L. B. Allard, J. Albert, J. L. Brebner, and G. R. Atkins
Opt. Lett. 22(11) 819-821 (1997)

Efficient refractive-index modification of fused silica by a resonance-photoionization-like process using F₂ and KrF excimer lasers

Kotaro Obata, Koji Sugioka, Toshimitsu Akane, Katsumi Midorikawa, Naoko Aoki, and Koichi Toyoda
Opt. Lett. 27(5) 330-332 (2002)

Dichroism in the absorption spectrum of photobleached ion-implanted silica

J. Albert, B. Malo, D. C. Johnson, F. Bilodeau, K.O. Hill, J. L. Brebner, and G. Kajrys
Opt. Lett. 18(14) 1126-1128 (1993)

Refractive-index changes in fused silica produced by heavy-ion implantation followed by photobleaching

J. Albert, B. Malo, K. O. Hill, D. C. Johnson, J. L. Brebner, and R. Leonelli
Opt. Lett. 17(23) 1652-1654 (1992)