Abstract
The resolution limits of conventional optical lithography reflect the low-pass spatial-frequency filter characteristics of the imaging system. Imaging interferometric lithography extends the resolution of optical lithography to the spatial-frequency limits of optics . Off-axis illumination downshifts the high-frequency components of the mask pattern. An interferometric beam at the wafer upshifts these frequency components back to their original spatial frequencies following the lens. reduction imaging interferometric lithography experiments demonstrate a continuous frequency coverage up to with a consequent threefold resolution enhancement.
© 1999 Optical Society of America
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