Abstract
Athermal silica-based interferometer-type planar light-wave circuits were realized by a newly developed multicore fabrication method. In this method, inductively coupled plasma-enhanced chemical-vapor deposition and polishing technologies are adopted on a silica substrate with a trench-type waveguide pattern prepared by reactive ion etching. Two kinds of deposited core material, (mol. %) and (mol. %), which show wavelength temperature dependence of 9.7 and , respectively, were used to prepare the waveguide sections in a device. By adjustment of the lengths of waveguide sections with these two different core materials, athermal characteristics of less than were achieved for Mach–Zehnder interferometer filter devices at the wavelength range while the temperature varied from to 80 °C. The new method is also applicable for the preparation of many other kinds of functional devices.
© 2003 Optical Society of America
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