Abstract
The damage threshold and damage mechanism of extreme-ultraviolet Sc/Si multilayer mirror coatings are investigated with focused nanosecond pulses at 46.9-nm radiation from a compact capillary-discharge laser. Damage threshold fluences of are measured for coatings deposited on both borosilicate glass and Si substrates. The use of scanning and transmission electron microscopy and small-angle x-ray diffraction techniques reveals the thermal nature of the damage mechanism. The results are relevant to the use of newly developed high-flux extreme-ultraviolet sources in applications.
© 2004 Optical Society of America
Full Article | PDF ArticleMore Like This
A. Ritucci, G. Tomassetti, A. Reale, L. Arrizza, P. Zuppella, L. Reale, L. Palladino, F. Flora, F. Bonfigli, A. Faenov, T. Pikuz, J. Kaiser, J. Nilsen, and A. F. Jankowski
Opt. Lett. 31(1) 68-70 (2006)
Paolo Ceccherini, Maria-G. Pelizzo, Paolo Villoresi, Sandro De Silvestri, Mauro Nisoli, and Salvatore Stagira
Appl. Opt. 38(21) 4720-4724 (1999)
Frank Barkusky, Armin Bayer, Stefan Döring, Peter Grossmann, and Klaus Mann
Opt. Express 18(5) 4346-4355 (2010)