Abstract
We report the optical characterization of a metal wiregrid micropolarizer array for IR imaging polarimetry. The micropolarizers are designed for operation in the band with a specially designed thin layer between the silicon substrate and the wiregrids to improve the performance at the shorter wavelengths. Deep-UV projection lithography is used to fabricate -deep wiregrids with a period. The extinction ratio and the transmission coefficient are measured with a tunable IR laser. A TM transmission coefficient greater than 70% with an extinction ratio greater than is achieved for the midwave-IR region while maintaining an extinction ratio better than for the near-IR region above .
© 2008 Optical Society of America
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