Abstract
We discuss the aberration-induced intensity imbalance of alternating phase-shifting mask (Alt-PSM) in lithographic imaging, in contrast to numerous studies on mask-induced intensity imbalance. Based on the Hopkins theory of partial coherent imaging, a linear relationship between the intensity difference of adjacent peaks in an Alt-PSM image and even aberration is established by formulations and verified by numerical results. The application of the linear relationship is briefly discussed.
© 2010 Optical Society of America
Full Article | PDF ArticleMore Like This
Bo Peng, Xiangzhao Wang, Zicheng Qiu, Yuting Cao, and Lifeng Duan
Appl. Opt. 49(15) 2753-2760 (2010)
Yuanying Tu, Xiangzhao Wang, Sikun Li, and Yuting Cao
Opt. Lett. 37(11) 2061-2063 (2012)
Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, and Lifeng Duan
Appl. Opt. 48(19) 3654-3663 (2009)